发明名称 DEVICE FOR PROVIDING A FLOW OF PLASMA
摘要 <p>The present invention provides a device (10) for forming at an ambient atmospheric pressure a gaseous plasma comprising active species for treatment of a treatment region. The device comprises a plasma cell (12) for forming the gaseous plasma for treating the treatment region. The plasma cell comprises an inlet (16) for receiving gas from a source (18) and an outlet (20) for discharging active species generated in the cell. A dielectric substrate (22) made of a polyimide encloses around a flow path for gas conveyed from the inlet to the outlet and an electrode (26) is formed on the dielectric substrate for energising gas along the flow path to form active species. A protective coating or lining (32) is located on an inner surface of the dielectric substrate (22) for resisting reaction on the active species generated in the plasma cell (12) with the material of the dielectric substrate (22).</p>
申请公布号 WO2012172285(A1) 申请公布日期 2012.12.20
申请号 WO2012GB00509 申请日期 2012.06.12
申请人 LINDE AKTIENGESELLSCHAFT;HOLBECHE, THOMAS, BICKFORD 发明人 HOLBECHE, THOMAS, BICKFORD
分类号 H05H1/24;A61B18/04;H01J37/32 主分类号 H05H1/24
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