| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve parallelism of exposure light to be applied to a mask and improve the exposure accuracy by suppressing flexure of a top board of a negative pressure chamber and correcting the parallelism of the exposure light by a plane mirror in a condition close to that at a time of the exposure. <P>SOLUTION: Before a mask 2 is retained on the lower part of an opening of a mask holder 20, while pushing from top portions of a top board 21 protruding from wall parts 20b, by a first pressing force with a plurality of pressing devices 23, the position of a retainer 62a is adjusted by an adjuster of each of support mechanisms 60 of a plane mirror support device 50, a position where a support member 61 supports the back face of a second plane mirror 38 is changed, and the parallelism of the light reflected by the second plane mirror 38 is corrected. The mask 2 is retained on the lower part of the opening of the mask holder 20 to form a negative pressure chamber 20c between the top board 21 and the mask 2. When the air in the negative pressure chamber 20c is removed, the plurality of pressing devices 23 press the portions of the top board 21 protruding from the wall parts 20b by a second pressing force that is larger than the first pressing force. <P>COPYRIGHT: (C)2013,JPO&INPIT |
