发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 <p>A semiconductor device comprising : a substrate (101); a carrier transport layer (103), which is composed of a III nitride semiconductor formed on the substrate and transports carriers in the direction along a main surface of the substrate; a barrier layer (104), which is formed on the carrier transport layer, and is composed of a second III nitride semiconductor having a bandgap larger than that of the first III nitride semiconductor; and an electrode (106) formed on the barrier layer. Furthermore, the semiconductor device is also provided with a cap layer (105), which is formed on the barrier layer (104) in the regions to the sides of the electrodes and is composed of a third III nitride semiconductor consisting of a mixture of single crystals and polycrystals.</p>
申请公布号 WO2012172753(A1) 申请公布日期 2012.12.20
申请号 WO2012JP03708 申请日期 2012.06.06
申请人 PANASONIC CORPORATION;NEGORO, NOBORU;UMEDA, HIDEKAZU;SHIOZAKI, NANAKO;UEDA, TETSUZO 发明人 NEGORO, NOBORU;UMEDA, HIDEKAZU;SHIOZAKI, NANAKO;UEDA, TETSUZO
分类号 H01L21/338;H01L21/205;H01L21/336;H01L29/778;H01L29/78;H01L29/786;H01L29/812 主分类号 H01L21/338
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