发明名称 DOPANT MATERIAL, SEMICONDUCTOR SUBSTRATE, SOLAR CELL ELEMENT, AND PROCESS FOR PRODUCTION OF DOPANT MATERIAL
摘要 A dopant material is disclosed. The dopant material comprises a polycrystalline silicon and a dopant element in the polycrystalline silicon. A concentration of the dopant element is at least 1×1018 atoms/cm3 and no greater than 1×1020 atoms/cm3. A method for producing a dopant material is also disclosed. A fused mixture is generated by mixing and fusing a silicon material with an element that serves as the dopant source. A coagulate of the dopant material is generated by cooling and coagulating the fused mixture. A semiconductor substrate is disclosed. The semiconductor substrate comprises a semiconductor material to which the dopant material is added. A solar cell element comprising the semiconductor substrate, a first electrode, and a second electrode is disclosed. The semiconductor substrate comprises a first surface and a second surface corresponding to a rear surface of the first surface.
申请公布号 US2012318350(A1) 申请公布日期 2012.12.20
申请号 US201113580664 申请日期 2011.02.23
申请人 SAKAI YOUHEI;KAWAMURA SATOSHI;TAKIMOTO MAYU;KYOCERA CORPORATION 发明人 SAKAI YOUHEI;KAWAMURA SATOSHI;TAKIMOTO MAYU
分类号 H01L29/16;H01L21/22;H01L31/0224 主分类号 H01L29/16
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