发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT
摘要 A semiconductor integrated circuit that is efficiently reduced in a noise level is offered. P-channel type MOS transistors M1 and M2 serving as differential input transistors have a thin gate oxide film in order to reduce the noise level. A protection circuit to protect the P-channel type MOS transistors M1 and M2 from overvoltage is formed including P-channel type MOS transistors M3 and M4. The P-channel type MOS transistor M3 is a first protection transistor to protect the P-channel type MOS transistor M1 from overvoltage, and is connected to a drain of the P-channel type MOS transistor M1. The P-channel type MOS transistor M4 is a second protection transistor to protect the P-channel type MOS transistor M2 from overvoltage, and is connected to a drain of the P-channel type MOS transistor M2.
申请公布号 US2012320482(A1) 申请公布日期 2012.12.20
申请号 US201213495797 申请日期 2012.06.13
申请人 ONISHI AKINOBU;HINOKUMA YASUHIRO;KOBAYASHI KAZUYUKI;MURASE KENGO;SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC 发明人 ONISHI AKINOBU;HINOKUMA YASUHIRO;KOBAYASHI KAZUYUKI;MURASE KENGO
分类号 H02H3/20 主分类号 H02H3/20
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