发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN-CURED FILM USING PHOTOSENSITIVE RESIN COMPOSITION, AND ELECTRONIC COMPONENT |
摘要 |
A photosensitive resin composition which contains (a) a polybenzoxazole precursor, (b) a sensitizing agent, (c) a solvent, (d) a crosslinking agent, and (e) a heterocyclic compound that has a hydroxyl group, an alkoxy group or a carboxyl group in each molecule. |
申请公布号 |
WO2012172793(A1) |
申请公布日期 |
2012.12.20 |
申请号 |
WO2012JP03846 |
申请日期 |
2012.06.13 |
申请人 |
HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD.;MINEGISHI, TOMONORI;KATOGI, SHIGEKI |
发明人 |
MINEGISHI, TOMONORI;KATOGI, SHIGEKI |
分类号 |
G03F7/085;C08G73/22;G03F7/004;G03F7/023;G03F7/40 |
主分类号 |
G03F7/085 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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