发明名称 |
PROJECTION EXPOSURE APPARATUS AND OPTICAL SYSTEM |
摘要 |
The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography, that includes at least one optical element and at least one manipulator having a drive device for the optical element. The drive device can have at least one movable partial element and at least one stationary partial element movable relative to one another in at least one direction of movement. |
申请公布号 |
US2012320353(A1) |
申请公布日期 |
2012.12.20 |
申请号 |
US201213589313 |
申请日期 |
2012.08.20 |
申请人 |
BLEIDISTEL SASCHA;GEUPPERT BERNHARD;CARL ZEISS SMT GMBH |
发明人 |
BLEIDISTEL SASCHA;GEUPPERT BERNHARD |
分类号 |
G03B27/34 |
主分类号 |
G03B27/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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