发明名称 SHIELDING FOR HIGH-VOLTAGE SEMICONDUCTOR-ON-INSULATOR DEVICES
摘要 Integrated circuits having doped bands in a substrate and beneath high-voltage semiconductor-on-insulator (SOI) devices are provided. In one embodiment, the invention provides an integrated circuit comprising: a semiconductor-on-insulator (SOI) wafer including: a substrate; a buried oxide (BOX) layer atop the substrate; and a semiconductor layer atop the BOX layer; a plurality of high voltage (HV) devices connected in series within the semiconductor layer; a doped band within the substrate and below a first of the plurality of HV devices; and a contact extending from the semiconductor layer and through the BOX layer to the doped band.
申请公布号 US2012319229(A1) 申请公布日期 2012.12.20
申请号 US201213596410 申请日期 2012.08.28
申请人 BOTULA ALAN B.;RAINEY BETH ANN;SHI YUN;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BOTULA ALAN B.;RAINEY BETH ANN;SHI YUN
分类号 H01L27/12 主分类号 H01L27/12
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