发明名称 EXPOSURE DEVICE AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure device and an exposure method, capable of accurately aligning a plurality of masks. <P>SOLUTION: An exposure device 1 uses at least one alignment mark 45 formed on a mask M and comprises: a reference bar 51 having a plurality of reference marks 55 corresponding to the alignment mark 45 of each mask M; and at least one camera 59 for imaging the reference marks 55 of the reference bar 51, and the alignment mark 45 of the mask M. Each mask M is aligned to the reference bar by displacing each mask holding part 11 to a predetermined position, based on relative position information read by the camera 59, between the reference marks 55 of the reference bar 51 and the alignment mark 45 of the mask M. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012252212(A) 申请公布日期 2012.12.20
申请号 JP20110125441 申请日期 2011.06.03
申请人 NSK TECHNOLOGY CO LTD 发明人 TOGASHI TAKUMI
分类号 G03F9/00;H01L21/027 主分类号 G03F9/00
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