EXHAUSTING METHOD, EXHAUSTING APPARATUS AND SUBSTRATE PROCESSING DEVICE
摘要
<p>An exhausting method, an exhausting apparatus and a substrate processing device. The exhausting method comprises the following steps: (1) setting at least two exhausting ports for a substrate processing chamber, and enabling the exhausting rates of the exhausting ports to be separately controlled; and (2) enabling the exhausting ports to exhaust outward at different exhausting rates. The exhausting apparatus comprises at least two exhausting ports connected to a substrate processing chamber. The exhausting rates of the exhausting ports may be separately controlled. The substrate processing device comprises a substrate processing chamber and the exhausting apparatus.</p>
