发明名称 |
OXIDE THIN FILM TRANSISTOR AND METHOD OF FABRICATING THE SAME |
摘要 |
<p>PURPOSE: An oxide thin film transistor and a manufacturing method thereof are provided to improve device characteristics by forming source and drain electrodes on the upper part and the lower part of an active layer to increase a contact area with the active layer. CONSTITUTION: A gate electrode(121) composed of a first conductive film is formed on a substrate(110). A gate insulating film(115a) is formed on the gate insulating film. A first data wiring and a second data wiring are formed on the gate insulating film. The first data wiring includes a source electrode(122), a first drain electrode(123) and a first data line(117). The second data wiring includes a second drain electrode(123') and a second data line(117'). An active layer(124) is formed on the upper part of the source electrode and the first drain electrode.</p> |
申请公布号 |
KR20120136695(A) |
申请公布日期 |
2012.12.20 |
申请号 |
KR20110055786 |
申请日期 |
2011.06.09 |
申请人 |
LG DISPLAY CO., LTD. |
发明人 |
KIM, HWAN;CHO, HEUNG LYUL;OH, TAE YOUNG;JUNG, JI EUN |
分类号 |
H01L29/786;G02F1/136;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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