发明名称 Method for manufacturing single-crystal silicon solar cell and single-crystal silicon solar
摘要 <p>There is disclosed a method for manufacturing a single-crystal silicon solar cell including the steps of: implanting a hydrogen ion or a rare gas ion into a single-crystal silicon substrate; forming a transparent insulator layer on a metal substrate; performing a surface activation treatment with respect to at least one of the ion implanted surface and a surface of the transparent insulator layer; bonding these surfaces; mechanically delaminating the single-crystal silicon substrate to provide a single-crystal silicon layer; forming a plurality of second conductivity type diffusion regions in the delaminated surface side of the single-crystal silicon layer so that a plurality of first conductivity type regions and the plurality of second conductivity regions are present in the delaminated surface of the single-crystal silicon layer; respectively forming a plurality of individual electrodes on the plurality of first and second conductivity type regions of the single-crystal silicon layer; forming respective collecting electrodes; and forming a transparent protective film. </p>
申请公布号 EP1981092(A3) 申请公布日期 2012.12.19
申请号 EP20080006092 申请日期 2008.03.28
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 ATSUO, ITO;AKIYAMA, SHOJI;KAWAI, MAKOTO;TANAKA, KOICHI;TOBISAKA, YUUJI;KUBOTA, YOSHIHIRO
分类号 H01L31/18;H01L31/0392;H01L31/068 主分类号 H01L31/18
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