发明名称 AMORPHOUS CARBON FILM FORMING METHOD AND DEVICE
摘要 An amorphous carbon film forming apparatus according to the present invention is characterized by being provided with a film forming furnace 11; plural workpiece fixtures 23 for supporting plural plate-like workpieces 22 in a state that the same are piled up vertically in parallel with the interval between facing surfaces of two vertically adjoining of the plate-like workpieces 22 being in a range of 2 to 30 millimeters, the plural workpiece fixtures 23 being arranged within the film forming furnace 11 at a regular angular interval on a circle and being connected to a negative electrode; nozzles 31, 32 provided for supplying a processing gas and including at least one nozzle arranged at a center of the circle on which the plural workpiece fixtures 23 are arranged and plural nozzles arranged at a regular angular interval on another circle which surrounds the workpieces fixtures 23 radially outside thereof; and a plasma power supply connected to at least the workpiece fixtures 23. By controlling the supply gas pressure to be in a range of 13 to 1,330 Pa and a sheath width to be made in a range of 2 to 30 mm, the discharge is kept stably. As a consequence, it can be realized to form amorphous carbon films efficiently at a low cost. <IMAGE>
申请公布号 EP1598442(A4) 申请公布日期 2012.12.19
申请号 EP20040710480 申请日期 2004.02.12
申请人 JTEKT CORPORATION 发明人 ANDO, JUNJI;SAKAI, NAOYUKI;SAITO, TOSHIYUKI;NAKANISHI, KAZUYUKI;MORI, HIROYUKI;TACHIKAWA, HIDEO;ITOU, KYOUJI;FUJIOKA, MIKIO;FUNAKI, YOSHIYUKI
分类号 C23C16/26;C23C16/27;C23C16/44;C23C16/455;C23C16/458;C23C16/503;C23C16/509;C23C16/52;F16D13/64;H01J37/00 主分类号 C23C16/26
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