发明名称 Recessed gate field effect transistor
摘要 <p>A semiconductor device having a gate positioned in a recess between the source region and a drain region that are adjacent either side of the gate electrode. A channel region is below a majority of the source region as well as a majority of the drain region and the entire gate electrode.</p>
申请公布号 EP2535938(A2) 申请公布日期 2012.12.19
申请号 EP20120171809 申请日期 2012.06.13
申请人 STMICROELECTRONICS INC;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CLEVENGER, LAWRENCE A.;RADENS, CARL;XU, YIHENG;ZHANG, JOHN H.
分类号 H01L29/66 主分类号 H01L29/66
代理机构 代理人
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