发明名称 Mask defect analysis
摘要 A method of inspecting a photomask includes directing radiation from a radiation source onto a photomask so that at least a portion of the radiation is transmitted through the photomask. A first photomask image is detected from the transmitted portion of the radiation transmitted through the photomask and perceptible at a second side of the photomask. A second photomask image is created by applying an exposure simulation model to a photomask design. A difference between the first photomask image and the second photomask image is then determined.
申请公布号 US8335369(B2) 申请公布日期 2012.12.18
申请号 US20070747150 申请日期 2007.05.10
申请人 HUANG LIANG-JUNG;DUAN CHEN-LONG;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 HUANG LIANG-JUNG;DUAN CHEN-LONG
分类号 G06K9/00;G03F1/00 主分类号 G06K9/00
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