| 摘要 |
PURPOSE: An antenna unit for inductively coupled plasma and an apparatus for processing the inductively coupled plasma are provided to control electric field intensity of an edge portion and a central portion of a side by supplying high frequency power to a first antenna unit and second antenna unit, respectively. CONSTITUTION: A part forming an induced electric field of an antenna(13) comprises a rectangular shaped plane corresponding to a rectangular substrate. A first antenna portion(13a) is formed by winding a plurality of antenna wires in a spiral shape. The plurality of antenna wires of the first antenna portion forms four edge portions for the rectangular shaped plane. The plurality of antenna wires of the first antenna portion combines four edge portions at a position which is different from the rectangular shaped plane. A second antenna portion(13b) forms the central portion of the four sides of the rectangular shaped plane. The plurality of antenna wires of the second antenna portion is prepared in order to combine the central portion of four sides at the position which is different from the rectangular shaped plane.
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