CLEANING COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR FORMING PHOTORESIST FINE PATTERN USING THE SAME

摘要

PURPOSE: A cleaning liquid composition for photolithography and a photoresist micropattern forming method using the same are provided to efficiently form micropatterns by reduce the hole sizes of photoresist patterns by including an ionic compound. CONSTITUTION: A cleaning liquid composition includes an ionic compound and a solvent. The ionic compound is selected from a compound represented by chemical formula 1, a compound represented by chemical formula 2, and the mixture of the compounds. In chemical formulas, R1 and R2 are hydrogen atoms or substituted or non-substituted C1-25 hydrocarbon groups. A photoresist micropattern forming method includes the following steps: a photoresist layer is formed on a semiconductor substrate; photoresist patterns are formed by exposing the developing the photoresist layer; the photoresist patterns are cleaned with the cleaning liquid composition; and the cleaned photoresist patterns are dried and hard baked to reduce the hole sizes of the patterns.