| 摘要 |
The invention provides an apparatus and method for use in the cleaning of soiled substrates, the apparatus comprising: (a) housing means (1), having: (i) a first upper chamber having mounted therein a rotatably mounted cylindrical cage, and (ii) a second lower chamber (3) located beneath the cylindrical cage; (b) at least one recirculation means (4); (c) access means (10); (d) pumping means (8); (e) a multiplicity of delivery means (6), wherein the rotatably mounted cylindrical cage comprises a drum (2) comprising perforated side walls, wherein up to 60% of the surface area of the side walls comprises perforations, and the perforations comprise holes having a diameter of no greater than 25.0 mm. The method involves cleaning the soiled substrate by treatment of the moistened substrate with a formulation comprising solid particulate cleaning material and wash water, the method being carried out using the apparatus of the invention. The apparatus and method find particular application in the cleaning of textile fabrics. |
