发明名称 ARTICLE FOR USE IN SEMICONDUCTOR PROCESS CHAMBER
摘要 <P>PROBLEM TO BE SOLVED: To provide a method and system for providing a texture to a surface of a workpiece, such as a chamber component. <P>SOLUTION: The method includes providing a workpiece to a texturizing chamber and scanning a beam of electromagnetic energy across the surface of the workpiece to form a plurality of features thereon. The features formed are generally depressions, protuberances, and combinations thereof. A method of reducing contamination in a process chamber is also provided. The method includes scanning a beam of electromagnetic energy across a surface of one or more process chamber components to form a plurality of features thereon, positioning the one or more chamber components into a process chamber, and initiating a process sequence within the process chamber. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012245565(A) 申请公布日期 2012.12.13
申请号 JP20120138357 申请日期 2012.06.20
申请人 APPLIED MATERIALS INC 发明人 POPIOLKOWSKI ALAN R;HART SHANNON M;SCHWEITZER MARC O;LIU ALAN B;WATIA JENNIFER L;WEST BRIAN;MENZIE MARK
分类号 B23K15/00;B24C11/00;B23K15/02;B23K15/06;C23F1/00;C23F4/00;H01L21/00;H01L21/02;H01L21/205;H01L21/3065 主分类号 B23K15/00
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