Method for manufacturing thin film solar cell, involves electrically passivating semiconductor surface according to formation of fixed charges in dielectric layer

摘要

The method involves forming a passivation layer (12) on semiconductor surface (20) of semiconductor layer (2). A buffer layer (11) made of oxide or nitride is provided between passivation layer and semiconductor surface. A cover layer (13) is formed on passivation layer made of aluminum oxide. The band gap of passivation layer is larger than band gap of buffer and cover layers. The charge carriers obtained from semiconductor layer are introduced into dielectric layer (1). The semiconductor surface is electrically passivated according to the formation of fixed charges in dielectric layer.