发明名称 HIGH-DEFINITION DEMETALIZATION PROCESS
摘要 <p>A method of producing images on a metalized substrate is described. The metalized substrate comprises a substrate having a top side and a bottom side and a metalized coating adhered to the top side of the substrate. The method comprises the steps of printing an image onto the metalized coating by selectively applying a protective coating of the image, curing the protective coating, applying a demetalizing solution onto the metalized substrate, rinsing the metalized substrate, drying the metalized substrate, applying an adhesive coating onto the metalized substrate, and removing the adhesive coating.</p>
申请公布号 WO2012169998(A1) 申请公布日期 2012.12.13
申请号 WO2011US21842 申请日期 2011.01.20
申请人 DESANTO, RONALD, F.;KAMMERER, NORMA, D.;ZAGAJOWSKI, ANTON III 发明人 KAMMERER, NORMA, D.;ZAGAJOWSKI, ANTON III
分类号 C23C22/00 主分类号 C23C22/00
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