发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A lithographic apparatus having an optical column capable of creating a pattern on a target portion of the substrate. The optical column may be provided with a self-emissive contrast device configured to emit a beam and a projection system configured to project the beam onto the target portion. The apparatus may be provided with an actuator to move the optical column or a part thereof with respect to the substrate. An optical sensor device is provided which is movable in respect of the optical columns and has a range of movement which enables the optical sensor device to move through a projection area of each of the optical columns to measure a beam of each of the optical columns. |
申请公布号 |
US2012314194(A1) |
申请公布日期 |
2012.12.13 |
申请号 |
US201113580361 |
申请日期 |
2011.02.18 |
申请人 |
ONVLEE JOHANNES;DE JAGER PIETER WILLEM HERMAN;VAN ZWET ERWIN JOHN;ASML NETHERLANDS B.V. |
发明人 |
ONVLEE JOHANNES;DE JAGER PIETER WILLEM HERMAN;VAN ZWET ERWIN JOHN |
分类号 |
G03B27/54 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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