GAS PREHEATING CYLINDER, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a gas introduction path which improves the heating efficiency of a film forming gas and heats the film forming gas to a temperature equivalent to the temperature of a processing substrate.

SOLUTION: A gas flowing through a gas supply pipe 340 flows from a gas introduction port 342 of a gas preheating cylinder 360 to a gas passage 374 in the gas preheating cylinder 360. An inner tube 350 inductively heated by an electromagnetic induction coil 207 heats the gas preheating cylinder 360 before a gas flowing through the gas passage 374 reaches a gas lead-out port 364 of the gas preheating cylinder 360, and the gas flowing through the gas passage 374 is evenly heated.

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