PVD HYBRID METHOD FOR DEPOSITING MIXED CRYSTAL LAYERS

摘要

The present invention relates to a method for depositing mixed crystal layers having at least two different metals (M1, M2) on a substrate by means of a PVD method. In order to provide a method for depositing mixed crystal layers having at least two different metals on a substrate by means of a PVD method, by means of which mixed crystal layers that are as free as possible from macroparticles (droplets) and that have as great a proportion as possible of a desired crystalline phase and that are highly crystalline are obtained, the deposition of the mixed crystal layer is performed while simultaneously applying I) the cathode sputtering method of dual magnetron sputtering or high power impulse magnetron sputtering (HIPIMS) and ii) arc vaporization (arc PVD).