发明名称 LINEAR DRIVE DEVICE, VARIABLE SHUTTER DEVICE, BEAM FORMING DEVICE, BEAM IRRADIATION DEVICE, DEFECT CORRECTION METHOD, AND METHOD FOR MANUFACTURING PATTERN SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a linear drive device having a simple configuration, a variable shutter device, a defect correction device using the same, a defect correction method, and a method for manufacturing a pattern substrate. <P>SOLUTION: The linear drive device includes: light-transmissive portions 122 for position detection which are moved in accordance with movement of shutter plates 120; light-transmissive portions 123 provided in the shutter plates 120 and have a prescribed length in a movement direction of the shutter plates 120; a light source which emits light to the light-transmissive portions 123 and the light-transmissive portions 122 for position detection; and photodetectors 166 which detect the light from the light source through the light-transmissive portions 122 for position detection and the light-transmissive portions 123. The linear drive device moves the shutter plates 120 on the basis of the detection results of the photodetectors 166. The variable shutter device includes the linear drive device, and the defect correction device and the defect correction method use the variable shutter device. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012247791(A) 申请公布日期 2012.12.13
申请号 JP20120157363 申请日期 2012.07.13
申请人 LASERTEC CORP 发明人 YONEZAWA MAKOTO;ISHIKAWA TAKUJI
分类号 G02B5/20;B23K26/00;B23K26/06;B23K26/073;B23K26/08;G02F1/13 主分类号 G02B5/20
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