发明名称 SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor storage device with reduced deterioration in reliability due to miniaturization. <P>SOLUTION: A semiconductor storage device according to an embodiment comprises a NAND cell unit including a plurality of electrically rewritable non-volatile memory cells each including a floating gate and a control gate on a semiconductor substrate. In the NAND cell unit, the non-volatile memory cells share a source region and a drain region, and are connected in series. The source region and the drain region of the non-volatile memory cells are formed using a silicide. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012248566(A) 申请公布日期 2012.12.13
申请号 JP20110116780 申请日期 2011.05.25
申请人 TOSHIBA CORP 发明人 KAMEI HIROSHI;SHINMYO SAORI;OTANI NORIO
分类号 H01L21/8247;H01L21/336;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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