SYSTEMS AND METHODS FOR BUFFER GAS FLOW STABILIZATION IN A LASER PRODUCED PLASMA LIGHT SOURCE
摘要
An extreme-ultraviolet (EUV) light source comprising an optic, a target material, mid a laser beam passing through said optic along a beam path to irradiate said target material; The EUV light source further includes a system generating a gas flow directed toward said target material along said beam -path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas fine outputtmg a gas stream into said volume.
申请公布号
WO2012170144(A1)
申请公布日期
2012.12.13
申请号
WO2012US37363
申请日期
2012.05.10
申请人
CYMER, INC.;FOMENKOV, IGOR, V.;FLEUROV, VLADIMIR, B.;PARTLO, WILLIAM, N.;ERSHOV, ALEXANDER, I.
发明人
FOMENKOV, IGOR, V.;FLEUROV, VLADIMIR, B.;PARTLO, WILLIAM, N.;ERSHOV, ALEXANDER, I.