发明名称 SCANNING AND DEGUMMING SYSTEM USING RADIO FREQUENCY, DIELECTRIC BARRIER ATMOSPHERIC PRESSURE GLOW PLASMA
摘要 Disclosed is a scanning and degumming system using radio frequency, dielectric barrier atmospheric pressure glow plasma, which system comprises a housing (105), a radio frequency power supply (111), a plasma generator (107), an air-inlet pipe (109), a scanning mechanical arm (106), a heating plate (110) and an air-discharge hood (102), wherein a table panel is provided in the middle of the housing (105); the radio frequency power supply (111) and air flow meters (112) are provided below the panel; the heating plate (110) and the scanning mechanical arm (106) are provided on the panel; the air discharge hood (102) is provided above the scanning mechanical arm (106); and the plasma generator (107) is mounted on the scanning mechanical arm (106). Air from an air source enters the plasma generator (107) via the air-inlet pipe (109) and the air flow meters (112); after the plasma generator (107) is coupled with the radio frequency power supply (111), plasma is generated below the plasma generator (107); the plasma is injected onto the silicon chips (301) on the surface of the heating plate (110), in order to remove the photoresist or organism on the surface of the silicon chips (301).
申请公布号 WO2012167410(A1) 申请公布日期 2012.12.13
申请号 WO2011CN01410 申请日期 2011.08.24
申请人 INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OFSCIENCES;WANG, SHOUGUO 发明人 WANG, SHOUGUO
分类号 H01J37/32;B08B7/00;G03F7/42;H01L21/00;H05H1/24 主分类号 H01J37/32
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