METHOD OF PLASMA DOPING USING PLASMA DOPING APPARATUS

摘要

PURPOSE: A plasma doping method using a plasma doping device is provided to increase doping concentration in a p-type polygate by ionizing boron using BF3 gas before doping with the polygate. CONSTITUTION: A doping object is loaded on a platen. Doping cycles(C11-C14) having plasma doping are performed on the doping object. Intermediate cycles(C21-C24) are repeatedly performed between the doping cycles. RF power having a first size and a negative DC pulse are applied during the doping cycle. The RF power supply is stopped after applying RF power having a second size in the intermediate cycle. [Reference numerals] (AA) RF power; (BB,DD) Time; (CC) DC pulse