发明名称 POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS USING SAID CHEMICALLY AMPLIFIED RESIST COMPOSITION
摘要 PURPOSE: A polymer compound is provided to form a pattern with excellent resolution and excellent rectangular ability and to obtain a resist material with good adhesion as a substrate. CONSTITUTION: A polymer compound contains a repeating unit in chemical formula 1. In chemical formula 1, R^1 is a hydrogen, fluorine, methyl, or trifluoromethyl, R^2, R^3 and R^4 is selected from a substituted or unsubstituted C1-10 linear, branched or cyclic alkyl, alkenyl and oxoalkyl or can form a ring with a sulfur atom combined with two or more of R^2, R^3 and R^4, X^1 is O or CH2, A^1 is a C1-10 linear, branched or cyclic divalent hydrocarbon group, B^1 is C1-10 alkylene or C6-18 arylene which can comprise hetero atoms except fluorine, and k^1 is 0 or 1.
申请公布号 KR20120134046(A) 申请公布日期 2012.12.11
申请号 KR20120056565 申请日期 2012.05.29
申请人 发明人
分类号 C08F20/10;C08L33/04;G03F7/027;G03F7/26 主分类号 C08F20/10
代理机构 代理人
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