发明名称 Imprint lithography
摘要 A method of making an imprint template includes providing a transfer layer on a substrate and providing a layer of imprintable medium on the transfer layer, using a master imprint template to imprint a pattern into the imprintable medium, polymerizing the imprintable medium by exposing it to actinic radiation, then etching the resulting polymer layer, the transfer layer and the substrate such that the imprinted pattern is transferred to the substrate, the substrate thereby becoming an imprint template bearing a pattern which is the inverse of a pattern provided on the master imprint template.
申请公布号 US8329052(B2) 申请公布日期 2012.12.11
申请号 US201113181084 申请日期 2011.07.12
申请人 WUISTER SANDER FREDERIK;DIJKSMAN JOHAN FREDERIK;KRUIJT-STEGEMAN YVONNE WENDELA;SCHRAM IVAR;ASML NETHERLANDS B.V. 发明人 WUISTER SANDER FREDERIK;DIJKSMAN JOHAN FREDERIK;KRUIJT-STEGEMAN YVONNE WENDELA;SCHRAM IVAR
分类号 B44C1/22 主分类号 B44C1/22
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