| 摘要 |
In a mask pattern used in effecting multi-path recording, (A) a recording permission ratio in each pixel row of a non-boundary area of a first pattern portion corresponding to a first nozzle block is substantially a first value, and a recording permission ratio in each pixel row of a non-boundary area of a second pattern portion corresponding to a second nozzle block adjacent the first nozzle block is substantially a second value, and (B) in a boundary area including a boundary between the first pattern portion and the second pattern portion, the recording permission ratio in each pixel row is between the first value and the second value, and the recording permission ratios in each pixel line are made different depending on a position with respect to a scanning direction. |
