发明名称 |
Pattern measurement apparatus and pattern measurement method |
摘要 |
A pattern measurement apparatus includes a beam intensity distribution creation unit to scan a charged particle beam over a reference pattern having edge portions formed at a right angle to create a line profile of the reference pattern and thus create a reference-beam intensity distribution, an edge width detection unit to determine line profiles for pattern models including edges formed at various inclination angles by use of the reference-beam intensity distribution and calculate edge widths reflecting an influence of a width of a reference beam, and a correspondence table creation unit to calculate correction values for edge positions from the calculated edge widths and the pattern models and create a correspondence table in which the edge widths and the correction values are associated with one another. |
申请公布号 |
US8330104(B2) |
申请公布日期 |
2012.12.11 |
申请号 |
US201113134290 |
申请日期 |
2011.06.03 |
申请人 |
MATSUMOTO JUN;ADVANTEST CORP. |
发明人 |
MATSUMOTO JUN |
分类号 |
H01J37/28;G01B15/00;H01J37/22 |
主分类号 |
H01J37/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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