发明名称 Intense pulsed light sintering system
摘要 PURPOSE: An ultra-short wave white light sintering system capable of preventing the oxidation phenomenon of metal particles is provided to irradiate ultra-short wave white light to a precursor or a micro metal-particle patterned on a flexible substrate for rapidly sintering the metal particles. CONSTITUTION: An ultra-short wave white light sintering system(100) includes a substrate(110). A power supply unit(120), and a charge storage unit(130), and a light emitting unit(140). Micro metal-particles or precursors are patterned on the surface of the substrate. The power supply unit generates the voltage and the current. The charge storage unit collects and stores the electric charge. The light emitting unit is located on the upper side of the substrate, and receives the voltage and the current from the power supply unit.
申请公布号 KR20120134035(A) 申请公布日期 2012.12.11
申请号 KR20120056100 申请日期 2012.05.25
申请人 发明人
分类号 B41M7/00;B22F3/00;C23C14/28 主分类号 B41M7/00
代理机构 代理人
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