发明名称 METHOD FOR MANUFACTURING MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing mask blanks suppressing the deterioration of flatness, and a method for manufacturing transfer masks. <P>SOLUTION: The method for manufacturing mask blanks includes steps of: preparing a glass substrate of which main surface is mirror polished; performing a heat treatment for the prepared glass substrate; and forming a thin film that is formed of a material including tantalum and substantially including no hydrogen, on the main surface of the glass substrate after the heat treatment. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012242634(A) 申请公布日期 2012.12.10
申请号 JP20110113075 申请日期 2011.05.20
申请人 HOYA CORP 发明人 NOZAWA JUN;KOMINATO ATSUSHI;SHISHIDO HIROAKI
分类号 G03F1/54 主分类号 G03F1/54
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