发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To reduce the time needed to search for marks formed on a substrate or an object to be processed. <P>SOLUTION: A substrate 30, or an object to be processed, is photographed in a visual field range S2 smaller than the substrate 30 sequentially from one field to another by moving the relative positions of the substrate 30 and a photographing unit to detect a mark 31 formed on the substrate 30. Here, if part of the mark 31 is included in the shot image, the relative positions of the substrate 30 and the photographing unit are moved until the whole of the mark 31 is positioned within the visual field range SF. Then, the mark 31 is shot by the photographing unit again and compared with a previously acquired comparison image of the mark 31, in which way the position of the mark 31 is detected. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012243987(A) 申请公布日期 2012.12.10
申请号 JP20110113435 申请日期 2011.05.20
申请人 RENESAS ELECTRONICS CORP 发明人 TAKAHASHI TOSHIRO
分类号 H01L21/027 主分类号 H01L21/027
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