| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a charged particle beam device which improves the reliability of the device by applying a voltage which suits conditions. <P>SOLUTION: A charged particle beam device 1 of the present invention is designed to be the one which irradiates an electron beam 16 upon a sample 24 held on a sample stage 25 by an electrostatic chuck 30 to generate an image of the sample 24. For this purpose, it comes with an electrostatic chuck control unit 13 which works in such a way that, when the sample 24 is held into place, a preset initial voltage is applied to a chuck electrode 26 of the electrostatic chuck 30 and also determination of whether the sample 24 is normally fitted by suction in the electrostatic chuck 30 is made. If the sample 24 is not found to have been normally fitted by suction in the electrostatic chuck 30, the voltage applied to the chuck electrode 26 is raised until the sample 24 is found to have been normally fitted by suction in the electrostatic chuck 30. <P>COPYRIGHT: (C)2013,JPO&INPIT |
