发明名称 ELECTRODE SUBSTRATE FOR CAPACITANCE TYPE INPUT DEVICE AND CAPACITANCE TYPE INPUT DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an electrode substrate for a capacitance type input device in which a level difference part in the thickness direction of an electrode formed by laminating a plurality of layers is difficult to be conspicuous and which includes equally high transparency over the whole surface. <P>SOLUTION: An electrode substrate 1 for a capacitance type input device for detecting capacitance includes a first transparent electrode pattern 10 extending in a first direction on one surface of a transparent substrate 4 and a second transparent pattern 20 extending in a second direction, intersecting the first electrode pattern through an insulator film 60, has an overcoat layer 70 covering the first electrode pattern 10 and the second electrode pattern 20, and a refractive index adjustment layer 80 covering the overcoat layer 70, and has an interface which changes from a low refractive index to a high refractive index from the transparent substrate 4 side to a top surface 82a side of the refractive index adjustment layer 80 between the top surface 70a of the overcoat layer 70 and the top surface 82a of the refractive index adjustment layer 80. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012243289(A) 申请公布日期 2012.12.10
申请号 JP20110116359 申请日期 2011.05.24
申请人 GEOMATEC CO LTD 发明人 SUGAWARA HIROYUKI
分类号 G06F3/041 主分类号 G06F3/041
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