发明名称 MANUFACTURING METHOD OF PATTERN-SHAPED METAL FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a pattern-shaped metal film capable of stably manufacturing a metal film of a desired pattern in a manufacturing method of a pattern-shaped metal film in which a thickness of a resist film is made relatively small and the metal film is overetched. <P>SOLUTION: A manufacturing method of a pattern-shaped metal film includes, in order, a step (A) of forming a pattern-shaped resist film on a metal film and a step (B) of etching the metal film. The resist film has a thickness of 5 &mu;m or lower and a pencil hardness of B or less. The step (B) overetches the pattern-shaped metal film so that a line width of the pattern-shaped metal film is 80% or lower based on a line width 100% of the resist film. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012243833(A) 申请公布日期 2012.12.10
申请号 JP20110110033 申请日期 2011.05.17
申请人 TORAY ADVANCED FILM CO LTD;TORAY IND INC 发明人 TOYOSHIMA YUTAKA;WAKAHARA RYUICHI
分类号 H05K3/06;C23F1/00;C23F1/02;H01L21/3213;H01L21/768 主分类号 H05K3/06
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