| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a continuous vacuum evaporator, with which a high quality deposition film can be continuously obtained without damaging a substrate and a deposition film by a sealing device. <P>SOLUTION: In a continuous vacuum evaporator, a substrate K is continuously passed through a vacuum container 6 by transferring the substrate K in the longitudinal direction thereof, and deposition is continuously performed on the substrate K within the vacuum container 6. The continuous vacuum evaporator includes a sealing device 60 which allows the substrate K to pass through a downstream side opening introducing the substrate K from an inside of the vacuum container 6 toward an outside thereof and is capable of bringing the inside of the vacuum container 6 into an airtight condition, The sealing device 60 includes: a sealing part 63 arranged between the front and back surfaces of the substrate K with a gap therebetween; and a magnetic fluid 69 held by the sealing part 63 and tightly sealing the gap. <P>COPYRIGHT: (C)2013,JPO&INPIT |
