| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern transfer method capable of performing residual film removal processing without performing etching. <P>SOLUTION: In the pattern transfer method, an optical reactive resin is formed over a substrate to be processed. The optical reactive resin is stamped with a mold including a transparent substrate having an uneven pattern and a light shielding film formed over a part of the surface of the uneven pattern. In the state the optical reactive resin is stamped with the mold, the optical reactive resin is irradiated with a beam of light through the mold. After irradiating the optical reactive resin with the light, the optical reactive resin is heated in the state the mold is stamped on the optical reactive resin. After heating the optical reactive resin, the mold is released from the optical reactive resin. After releasing the mold, the optical reactive resin is washed with a cleaning liquid. <P>COPYRIGHT: (C)2013,JPO&INPIT |
