BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR PRODUCING RELIEF PATTERN AND ARTICLE USING THE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a base generator which is easy to purify and excellent in sensitivity, solvent solubility and affinity with a polymeric precursor to be combined therewith.

SOLUTION: The base generator has a specific structure and generates a base by irradiation with electromagnetic wave and heating. The photosensitive resin composition includes: the base generator; and a polymeric precursor the reaction of which to an end product is accelerated by a basic substance, or by heating in the presence of the basic substance.

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