OXIDE SPUTTERING TARGET AND METHOD OF MANUFACTURING THE SAME, AND BUFFER POWDER USED THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide an oxide sputtering target which can be prevented from breakage when cooled after sintering, a method of manufacturing the same, and buffer powder used therefor.

SOLUTION: The method includes a step of forming a compressed body containing metal oxide powder which expands when cooled after sintering, a step of placing the compressed body in a mold, filling buffer powder to the outer circumference of the compressed body in the mold and performing hot-processing in this state to manufacture an oxide sintered body 4 to form an oxide sputtering target. The buffer powder 3 is sintered by the heating of the hot-processing, and the sintered body derived from the buffer powder 3 is broken by the expansion of the oxide sintered body 4 when it is cooled after the sintering.

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