发明名称 EXPOSURE EQUIPMENT AND SHADING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure equipment capable of exposing a panel with a high efficiency and a low cost even when exposing substrates with different cell layout, and to provide a shading plate used in the exposure equipment. <P>SOLUTION: In an exposure equipment, a mask 20 for exposure has an arrangement of a plurality of pattern areas 20a corresponding to a display panel. A microlens array 22 is provided with two microlens array chips 22a in a direction vertical to a scan direction so that a part thereof is overlapped each other in the direction vertical to the scan direction. A shading plate 30 shades a part of the microlens array chip 22a, and an opening of the shading plate 30 regulates light transmission of the microlens array chip such that one microchip array 22a exposes two pattern areas 20a only, while the other microchip array 22a exposes three pattern areas 20a only. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012242454(A) 申请公布日期 2012.12.10
申请号 JP20110109765 申请日期 2011.05.16
申请人 V TECHNOLOGY CO LTD 发明人 ARAI TOSHINARI;HASHIMOTO KAZUSHIGE
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址