| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus capable of selectively vapor-depositing a vapor deposition material on a part of a concavo-convex shape, when a long sheet whose surface has the concavo-convex shape is used. <P>SOLUTION: The vapor deposition apparatus is used for selectively vapor-depositing the vapor deposition material M on a part of the concavo-convex shape in the long sheet W1 whose surface has the concavo-convex shape. The vapor deposition apparatus 1 includes a conveying part 20 which conveys the long sheet W1, a vapor deposition source 30 which houses and heats the vapor deposition material M when vapor depositing, and an emission direction limiting part 40 which limits the emission direction of the vapor deposition material M. <P>COPYRIGHT: (C)2013,JPO&INPIT |
