| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a plasma treatment apparatus capable of removing adsorption gas in the plasma treatment apparatus under atmospheric pressure. <P>SOLUTION: The plasma treatment apparatus includes: a gas discharge part 10 including gas piping 11, a pair of electrodes 13a and 13b by which high-frequency voltage is applied in the vicinity of a gas discharge port 111 of the gas piping 11, and a piping support member 17 which supports the gas piping 11 in the vicinity of the gas discharge port 111; an adsorption gas elimination part 30 which eliminates adsorption gas deposited in the vicinity of the gas discharge port 111 of the gas discharge part 10; and a stage 51 which holds a processing object to be subjected to plasma treatment using plasma gas discharged from the gas discharge part 10. The adsorption gas elimination part 30 includes: a chamber 31 which forms a sealed space around the gas discharge port 111 by contacting the piping support member 17; an exhaust part 34 which performs exhaust of the chamber 31; and a gas analysis part 38 which measures the concentration of the adsorption gas in the chamber 31. <P>COPYRIGHT: (C)2013,JPO&INPIT |
