| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve throughput of electron beam exposure to a wiring pattern. <P>SOLUTION: A generation method of exposure data comprises: a pattern division step of dividing layer patterns of respective layers provided in a first multilayer wiring pattern generated according to a net list and a prescribed wiring rule into each prescribed subfield; an extraction step of referring to a pattern database where a subfield pattern of a wiring layer provided in a second multilayer wiring pattern generated in the prescribed subfield according to the prescribed wiring rule and a pattern identifier corresponding to the subfield pattern are registered, and extracting the pattern identifier of the subfield pattern corresponding to the divided layer pattern of the first multilayer wiring pattern; and an exposure data generation step of generating exposure data having the extracted pattern identifier and an exposure position of the subfield pattern corresponding to the extracted pattern identifier. <P>COPYRIGHT: (C)2013,JPO&INPIT |
