| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of allocating a pupil facet to a field facet. <P>SOLUTION: There is provided a method of allocating a pupil facet of a pupil facet mirror of an illumination optical unit of a projection exposure device to a field facet of a field facet mirror of the illumination optical unit so as to define an illumination channel for a partial beam of illumination light. Firstly, at least one illumination parameter is identified. Then an evaluation function of evaluating a possible illumination channel is defined in advance. A stage of calculating an evaluation variable follows them. An illumination channel having an evaluation variable achieving an evaluation target range is selected in advance. At least one disturbance variable and dependency of the illumination function on the disturbance variation are identified. The disturbance variable is varied within a disturbance variable variation range defined in advance, and variation in evaluation variable is calculated based upon the evaluation function. An illumination channel which stays within the evaluation target range over the entire variation range and has the varied evaluation variable is selected. <P>COPYRIGHT: (C)2013,JPO&INPIT |
