| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid processing apparatus and a liquid processing method which optimize the state of air flow above a substrate according to a process of the liquid processing. <P>SOLUTION: A liquid processing apparatus 1 performing liquid processing to a substrate W comprises: a support member 10 horizontally supporting the substrate W and rotating; a gap formation member 20 forming an annular gap GP between itself and an outer peripheral part 13 of the support member 10; a liquid supply member 30 supplying a process liquid to the substrate W from above; and a cup 40 enclosing the annular gap GP and recovering the process liquid shaken off from the rotating substrate W through the annular gap GP; and a lifting mechanism 122 moving up and down the gap formation member 20. <P>COPYRIGHT: (C)2013,JPO&INPIT |
