发明名称 METHOD FOR MANUFACTURING SUBSTRATE WITH RECESS AND PROJECTION SCREEN
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate with recesses capable of uniformizing the shape of the recesses to be formed. <P>SOLUTION: The method for manufacturing a substrate with a plurality of recesses includes: a mask layer forming step S2 for forming a mask layer with a plurality of openings on a substrate; etching steps S3 and S6 for etching the substrate via the openings to form the recesses; cleaning steps S4 and S7 for cleaning the recesses with acidic solution; and a mask layer removal step S8 for removing the mask layer. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012242716(A) 申请公布日期 2012.12.10
申请号 JP20110114421 申请日期 2011.05.23
申请人 SEIKO EPSON CORP 发明人 OTANI HIDEKATSU
分类号 G03B21/60;G02B5/10;G03B21/62 主分类号 G03B21/60
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